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Denton Vacuum

Moorestown,  NJ 
United States
http://www.dentonvacuum.com
  • Booth: 5583

Overview

Denton Vacuum provides innovative deposition and etch equipment solutions built on standard platforms for any production level, from pilot production to high-volume manufacturing. With a long history of innovation in thin film deposition and etch technologies, we provide production-proven systems in diverse applications including laser and IR detectors, AR/VR and flexible display, delayering, precision optics, and superconductors to match customer needs.

  Press Releases

  • Moorestown, NJ, July XX, 2022 — Denton Vacuum LLC today announced it has won a new system order from a leading Asian organization specializing in advanced development and manufacturing transfer of sensors and MEMS production [SCL].  Denton will be providing a Versa Cluster tool optimized for these applications.  The Versa platform is a highly flexible platform supporting all Denton magnetron sputtering technologies, including standard large area cathodes, R&D focused confocal configurations, and Isoflux ultra high uniformity cathodes.

    Dr. David Douglass, Senior Product Manager at Denton Vacuum, commented “Denton’s Versa platform is optimized to support all of our proprietary magnetron sputtering technologies. We can add standard large area cathodes for high volume production, or confocal configurations for multi-material deposition in a single chamber. This also supports our plasma emission control technology for high rate reactive processes and in-situ alloying.  Our Isoflux ultra high uniformity cathodes are capable of producing films with nonuniformities below 1%, particularly applicable to barrier layers and other very thin films.”

    Frank Cumbo, President and CEO of Denton Vacuum, added that “in addition to magnetron sputtering, the Versa platform can support combining out ion beam sputtering, ion beam etch, and PE-CVD modules. This enables Denton to provide comprehensive production solutions on a single system, tailored to our customers’ needs.  We are excited to be able to offer all of our latest technologies, both internally developed and acquired, on this single platform. We believe our strategy of providing a flexible platform to meet a wide range of emerging is well suited to market demand.”

    For more information, contact Dr Douglass at ddouglass@dentonvacuum.com

    About Denton Vacuum LLC

    Denton Vacuum empowers the optoelectronic and semiconductor markets, helping engineers optimize processes and solve production challenges while improving manufacturing yields and gaining efficiency and throughput. Denton’s continuous commitment to research and development of thin film technology, including its proprietary integrated diagnostic systems, enables predictable, repeatable performance in a wide process window. Denton’s breadth of technologies and market focus pave the way in advancing such diverse applications as electron microscopy and microanalyses to providing market-leading solutions for IR detectors, semiconductor lasers and precision optics.

    Contact information:

    Visit our website at www.dentonvacuum.com or call toll free 1-800-666-6004.

  • Moorestown, NJ, July 6, 2022 — Denton Vacuum LLC announces it won a new system order from a leading Asian organization for a Versa Cluster tool for advanced development and manufacturing transfer of sensors and MEMS production. The Versa platform is a configurable platform that supports Denton’s magnetron sputtering technologies including standard large area cathodes, R&D focused confocal configurations, and Isoflux ultra high uniformity cathodes.

    Dr. David Douglass, Senior Product Manager at Denton Vacuum, commented “our Versa platform is optimized to support all our proprietary magnetron sputtering technologies. We can add standard large area cathodes for high volume production or utilize confocal configurations for multi-material deposition in a single chamber. Versa also supports our plasma emission control technology for high-rate reactive processes and in-situ alloying. Our Isoflux cathodes can produce films with nonuniformities below 1%, especially for barrier layers and other very thin films.”

    Frank Cumbo, President and CEO of Denton Vacuum, added that “in addition to magnetron sputtering, the Versa platform can support combining our ion beam sputtering, ion beam etch, and PE-CVD modules. This means Denton can provide comprehensive production solutions on a single system, tailored to a customer’s needs. We are excited to offer every one of our latest technologies, both internally developed and acquired, on this single platform. We believe our strategy of providing a flexible platform to meet a wide range of emerging applications is well suited to market demand.”

    For more information, contact Dr Douglass at ddouglass@dentonvacuum.com

    About Denton Vacuum LLC

    Denton Vacuum empowers the optoelectronic and semiconductor markets, helping engineers optimize processes and solve production challenges while improving manufacturing yields and gaining efficiency and throughput. Denton’s continuous commitment to research and development of thin film technology, including its proprietary integrated diagnostic systems, enables predictable, repeatable performance in a wide process window. Denton’s breadth of technologies and market focus pave the way in advancing such diverse applications as electron microscopy and microanalyses to providing market-leading solutions for IR detectors, semiconductor lasers and precision optics.

    Contact information:

    Visit Denton at www.dentonvacuum.com or call toll free 1-800-666-6004.

  • Moorestown, NJ, February 10, 2023 — Denton Vacuum LLC announced today that they have won a third order for the Infinity FA failure analysis system from a leading global semiconductor memory device manufacturer. The Infinity FA is an ion beam etch chip delayering system for semiconductor failure analysis and quality assurance. This third system will be placed at a second manufacturing location as the process and technology has been validated in their R&D center.

    Frank Cumbo, President and CEO of Denton Vacuum, commented, “This third system order shows our customer is realizing the benefit of pushing higher capability FA techniques out of the lab and into the fab. This is enabling faster defect identification and next generation device optimization. The low ion energy is particularly important for advanced chips based on 7nm or less processes. High ion energies like those in focused ion beam and other ion beam technologies will damage the features of interest, preventing proper failure analysis.”

    Dr. David Douglass, Senior Product Manager at Denton Vacuum, added, “Denton’s low ion energy, broad beam etch capability uniquely enables large area, rapid processing of semiconductor devices. Traditionally, this is a very slow, iterative process requiring highly skilled operators and multiple delayering techniques. The Infinity FA is able to rapidly etch highly uniform, planar, large areas of interest. The integrated Secondary Ion Mass Spectrometer (SIMS) enables precision end pointing at each layer.”

    For more information, contact Dr. Douglass at ddouglass@dentonvacuum.com

    About Denton Vacuum LLC

    Denton Vacuum empowers the optoelectronic and semiconductor markets, helping engineers optimize processes and solve production challenges while improving manufacturing yields and gaining efficiency and throughput. Denton’s continuous commitment to research and development of thin film technology, including its proprietary integrated diagnostic systems, enables predictable, repeatable performance in a wide process window. Denton’s breadth of technologies and market focus pave the way in advancing such diverse applications as electron microscopy and microanalyses to providing market-leading solutions for IR detectors, semiconductor lasers and precision optics.

    Contact information:

    Visit Denton at www.dentonvacuum.com or call toll free 1-800-666-6004.

    Find our latest Press Release on Seeking Alpha.

  Products

  • Versa Cluster Platform
    Denton Vacuum’s proprietary Versa cluster platform is an automated front-end option for high-volume manufacturing....

    • Denton's Versa Cluster platform can be configured with up to two cassette load locks and six coating chambers or modules. A robotic semiconductor-grade handler moves the substrates from the load locks to the modules to be coated in multiple layers of different materials without breaking vacuum.

    The Versa is designed to work with 200mm or 300mm process modules. It’s compatible with the Discovery sputter module and the Voyager PE-CVD system, and features dedicated sputter etch modules and dedicated metrology options. A dedicated pre-clean module is available as well, along with substrate conditioning.

    To enable high-volume production during thin film deposition, the Versa runs on Denton’s ProcessPro-HV software, which uses a fully automated material scheduler and recipe manager to load the modules and execute process steps across multiple chambers with accuracy and efficiency. ProcessPro-HV is SEMI E95 compliant and features comprehensive data logging and charting within the tool for process control and analysis.

  • Discovery
    The Discovery® series of magnetron sputter deposition systems are highly configurable and can be tailored to meet the specific requirements of different applications....

    • DISCOVERY SPUTTER DEPOSITION PLATFORMS

    DISCOVERY 200 CATHODE CONFIGURATIONS

    The Discovery 200 module accommodates up to 200mm wafers and four 4” cathodes with tri-axis adjustment of radius, distance, and angular presentation to provide <+/-5% coating uniformity.

    DISCOVERY 300 CATHODE CONFIGURATIONS

    The Discovery 300 module accommodates up to 300mm substrates and three 6” cathodes with tri-axis adjustment of radius, distance, and angular presentation to provide <+/-5% coating uniformity.

    DISCOVERY V CATHODE CONFIGURATION

    The Discovery V module is a high rate, highly uniform deposition module, optimized for integration on the Versa platform. It is configured with a large area planar magnetron. In a planar magnetron configuration, the cathode is mounted directly above the substrate for maximum deposition rate and productivity. Uniformity is optimized by recipe-controlled source-to-substrate adjustment.

    DISCOVERY I CATHODE CONFIGURATION

    The Discovery I module offers inverted cylindrical magnetron technology which provides best-in-class uniformity on flat and curved substrates. It can be configured to coat 3D substrates as well. Uniformity is optimized by recipe-controlled source-to-substrate adjustment.

  • Infinity Ion Beam Deposition System
    The Infinity IBD System delivers dense, lower defects films with extremely high precision and uniformity. It offers independent control over ion energies, so you can achieve exacting thin film specs with very low contamination from flaking....

    • Infinity Ion Beam Deposition System

    The Infinity IBD System delivers dense, lower defects films with extremely high precision and uniformity. It offers independent control over ion energies, so you can achieve exacting thin film specs with very low contamination from flaking.

    Infinity Bias Target Sputter System

    The Bias Target Sputter module offers excellent control of thin film interfaces, provides independent control over ion currents and energies, and operates at a low pressure. This eliminates contamination and scatter from beam overspill, prevents surface damage, enables tight stress control, and creates dense, defect-free films.

Categories

1 FLEX
  • Processing & Manufacturing
  • Tools & Equipment
    • 100 Electronic System Design
  • System Design and Specification Tools
    • 205 Nanotechnology Equipment and Tools
  • Equipment, Nanotechnology Tools
    • 206 PV Equipment
  • Thin Film
    • 207 Process Equipment
  • Deposition; (CVD, PVD, ALD, Plating)
  • Deposition; PVD; Sputtering; Evaporation Equipment
  • Ion; E-Beam Milling Etching Equipment
    • 300 Packaging and Assembly Materials
  • Thin Film; Dielectric Film Materials
    • 301 Chemicals & Solids
  • Surface protection material; coatings
    • 307 Process Materials
  • Deposition/Target Materials
    • 400 Components, Parts & Accessories
  • Vacuum Systems Components and Accessories
    • 401 Sub-systems
  • Process Monitoring systems
  • Pumps, Vacuum
    • 500 Factory Monitoring & Control Systems (FMCS)
  • Process Controls
    • 701 Manufacturing Services or Consulting
  • Manufacturing Process Support and Development

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